| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2026 | 03 | WO/2026/012667 | RETICLE CAPTURE ARRANGEMENT FOR A LITHOGRAPHIC APPARATUS | EP2025/066257 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/012668 | WAFER STAGE SYSTEM, METHOD, AND LITHOGRAPHIC APPARATUS PROVIDED WITH THE WAFER STAGE | EP2025/066295 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/012675 | METHOD AND APPARATUS FOR SHORT WAVELENGTH METROLOGY | EP2025/066541 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/012700 | SYSTEM AND METHOD FOR COMPACT DISPLAY OF OPTICAL MEASUREMENT INFORMATION | EP2025/066995 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/012762 | SYSTEM AND METHOD FOR THERMAL CONTACT MODULATION BETWEEN OBJECT AND CLAMP | EP2025/068116 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/013230 | HOLDING DEVICE | EP2025/069842 | G03F 7/00 | PHYSIK INSTRUMENTE (PI) SE & CO. KG | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/014147 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JP2025/021544 | G03F 7/039 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/014250 | RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | JP2025/022963 | G03F 7/11 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/014261 | CURABLE COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND COMPOUND | JP2025/023143 | G03F 7/004 | FUJIFILM CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/014262 | CURABLE COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | JP2025/023144 | G03F 7/027 | FUJIFILM CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/014337 | METHOD, ADJUSTMENT METHOD, AND EXPOSURE DEVICE | JP2025/023889 | G03F 7/20 | NIKON CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/014418 | TREATMENT SOLUTION AND METHOD FOR USING SAME | JP2025/024354 | G03F 7/42 | NIPPON KAYAKU KABUSHIKI KAISHA | PHYSICS | فیزیک | ابزارها | 2026 | 03 | WO/2026/014795 | CURABLE COMPOSITION, CURED FILM PRODUCED USING COMPOSITION, AND DISPLAY DEVICE COMPRISING CURED FILM | KR2025/009420 | G03F 7/105 | SAMSUNG SDI CO., LTD. | PHYSICS | فیزیک | ابزارها |